Bent crystals have emerged as innovative tools for manipulating high-energy particle beams, offering unparalleled precision in beam steering for accelerator physics. However, the practical application of these devices is hindered by nuclear dechanneling, limiting channeling efficiency to approximately 80%. The GALORE project addresses this limitation by introducing a novel bent crystal design featuring a microtrench structure. Acting as a crystalline lens, the microtrench minimizes nuclear interactions, thereby significantly enhancing channeling efficiency. This paper details the fabrication process for these advanced bent crystals, utilizing high-purity silicon wafers and state-of-the-art micromachining techniques. A silicon nitride thin film induces controlled curvature, while Deep Reactive Ion Etching (DRIE) is employed to create the microtrench with sub-micron precision. Characterization studies confirm the structural integrity and channeling potential of the microstructures. These results represent a significant milestone in the development of bent crystals capable of achieving near-ideal channeling efficiency—a breakthrough in crystal-assisted particle beam technology. This advancement holds the potential to revolutionize collimation systems, enhance fixed-target experiments, and shape the design of next-generation accelerators.
Crystal fabrication techniques for enhanced performance in planar channeling
Romagnoni, Marco
Primo
;Bandiera, Laura;Canale, Nicola;Fedeli, Pierluigi;Guidi, Vincenzo;Malagutti, Lorenzo;Mazzolari, Andrea;Negrello, Riccardo;Paternò, Gianfranco;Sytov, Alexei;Tamisari, Melissa;Tikhomirov, Viktor
2026
Abstract
Bent crystals have emerged as innovative tools for manipulating high-energy particle beams, offering unparalleled precision in beam steering for accelerator physics. However, the practical application of these devices is hindered by nuclear dechanneling, limiting channeling efficiency to approximately 80%. The GALORE project addresses this limitation by introducing a novel bent crystal design featuring a microtrench structure. Acting as a crystalline lens, the microtrench minimizes nuclear interactions, thereby significantly enhancing channeling efficiency. This paper details the fabrication process for these advanced bent crystals, utilizing high-purity silicon wafers and state-of-the-art micromachining techniques. A silicon nitride thin film induces controlled curvature, while Deep Reactive Ion Etching (DRIE) is employed to create the microtrench with sub-micron precision. Characterization studies confirm the structural integrity and channeling potential of the microstructures. These results represent a significant milestone in the development of bent crystals capable of achieving near-ideal channeling efficiency—a breakthrough in crystal-assisted particle beam technology. This advancement holds the potential to revolutionize collimation systems, enhance fixed-target experiments, and shape the design of next-generation accelerators.I documenti in SFERA sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.


