The synthesis and the characterization of new cyclic and polymeric phosphazenes with interesting applicative potential in the photochemical domain is reported. In particular cyclic and polyphosphazene derivatives containing 4-tert-butoxycarbonyloxyphenoxy (BOC) residues, cyclophosphazenes substituted with dialkoxyacetophenone groups and bearing tertiary amines as side phosphorus substituents are described.

Photosensitive phosphazene substrates: synthesis and characterization

Fantin, G;Fogagnolo, M;Medici, A;Pedrini, P;
1997

Abstract

The synthesis and the characterization of new cyclic and polymeric phosphazenes with interesting applicative potential in the photochemical domain is reported. In particular cyclic and polyphosphazene derivatives containing 4-tert-butoxycarbonyloxyphenoxy (BOC) residues, cyclophosphazenes substituted with dialkoxyacetophenone groups and bearing tertiary amines as side phosphorus substituents are described.
1997
Fantin, G; Fogagnolo, M; Medici, A; Pedrini, P; Gleria, M; Minto, F
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11392/1204874
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