The control of the domain patterns in systems with perpendicular magnetic anisotropy (PMA) is of great interest because of their applications on magnetic storage or spintronic devices. Different approaches are investigated to achieve a high magnetic stability. In systems comprised of noble metals such as Pt or Pd, the principal drawback is the high spin orbit interaction that increases the magnetic damping constant. Amorphous Tb-Fe alloys exhibit a pretty large PMA constant that reaches 106 J/m3. Recently, it has been reported a constant of at least 1×105 J/m3 in TbFeGa alloys [1]. We have deposited TbFeGa films by cosputtering using two targets with a composition of TbFe2 and Fe3Ga. Two series of samples were obtained by applying a different type of power source (DC or pulsed) in each target. In particular, the evaporation of TbFe2 by means of the DC source enhances the out of plane component of the magnetization (Fig. 1). The results indicate that this can be due to the Tb enrichment of the TbFe2-based phases present in the alloys. Therefore, the magnetic domain pattern can be tailored by means of the composition and the type of power source used in each sputtering target.
TAILORING THE MAGNETIC DOMAIN PATTERNS OF SPUTTERED TbFeGa ALLOYS
FIN, Samuele;BISERO, Diego;
2013
Abstract
The control of the domain patterns in systems with perpendicular magnetic anisotropy (PMA) is of great interest because of their applications on magnetic storage or spintronic devices. Different approaches are investigated to achieve a high magnetic stability. In systems comprised of noble metals such as Pt or Pd, the principal drawback is the high spin orbit interaction that increases the magnetic damping constant. Amorphous Tb-Fe alloys exhibit a pretty large PMA constant that reaches 106 J/m3. Recently, it has been reported a constant of at least 1×105 J/m3 in TbFeGa alloys [1]. We have deposited TbFeGa films by cosputtering using two targets with a composition of TbFe2 and Fe3Ga. Two series of samples were obtained by applying a different type of power source (DC or pulsed) in each target. In particular, the evaporation of TbFe2 by means of the DC source enhances the out of plane component of the magnetization (Fig. 1). The results indicate that this can be due to the Tb enrichment of the TbFe2-based phases present in the alloys. Therefore, the magnetic domain pattern can be tailored by means of the composition and the type of power source used in each sputtering target.I documenti in SFERA sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
